L. M. Duc, C.M. Tan, M. Luo and I. C. H. Leng “Maintenance Scheduling of Plasma Etching Chamber in Wafer Fabrication for high yield etching process”, IEEE Trans. On Semiconductor Manufacturing, vol. 27, no. 2, pp. 204-211, May 2014.
https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=6731582