C. M. Tan and Y. Hou. “Revisit to the finite element modeling of electromigration for narrow interconnects,” Journal of Applied Physics, vol. 102, no. 3, pp. 33705, 2007.
C. M. Tan and Y. Hou. “Revisit to the finite element modeling of electromigration for narrow interconnects,” Journal of Applied Physics, vol. 102, no. 3, pp. 33705, 2007.